UVISEL

UVISEL ellipsometers offer a modular design, enabling the best fit to your applications. Four spectral ranges are available covering wavelengths from 190 to 2100nm. Full automation, a large variety of accessories and integrated microspot optics make the UVISEL a powerful and versatile spectroscopic ellipsometer for demanding research and industrial quality control.

The UVISEL can be used either ex-situ or in-situ for integration with process chambers or roll-to-roll machines. A new configuration, called the UVISEL LT, features a compact, integrated goniometer to provide a very cost-effective ellipsometer.

The DeltaPsi2 software platform provides a complete measurement, modeling, and reporting package addressing both routine and advanced thin film applications.

From thin to thick layers, with or without a transparent substrate, in the fields of semiconductors, flat panel displays, optoelectronics, photovoltaics, and optical and functional coatings, the UVISEL is the best solution for precise characterization of thin film structures.

Product benefit

  • Highest precision, sensitivity, and resolution

  • Large spectral range: 190-2100 nm

  • Modular design

  • Fully integrated software package

Obtained information

  • Thin film thickness from 1Å to >45µm*
  • Optical constants (n,k) for isotropic, anisotropic, and graded films
  • Surface and interface roughness
  • Derived optical properties such as absorption coefficient α and optical bandgap Eg
  • Material properties: compound alloy composition, porosity, crystallinity, morphology, uniformity
  • Mueller matrix
  • Depolarization

*depending on material absorption

Manufactured by HORIBA Scientific

The UVISEL spectroscopic ellipsometer is available in four configurations:

                 190nm UVISEL Extended Range 2100 nm

UVISEL Extended Range

245 nm UVISEL NIR 2100 nm

UVISEL NIR

UVISEL

210 nm UVISEL VIS 880 nm

UVISEL VIS

190 nm UVISEL FUV880 nm

        UVISEL FUV

UVISEL Specifications

  • ​Spectral range: 190-880 nm │ 210-880 nm │245-2100 nm │ 190-2100 nm
  • Detection: High resolution monochromator coupled to sensitive detectors or 32/64 multiwavelengths system for fast acquisition

Manual Configuration

  • Spot size: 0.08 – 0.1 – 1 mm (pinhole); 50µm FWHM on request
  • Sample stage: 150 mm, manual height (4mm) and tilt adjustment
  • Goniometer: Manually adjustable angle from 55° to 90° by step of 5°

Automatic Configuration

  • Manual or automated spot size: 0.08 - 0.1 - 1 mm or 0.08 - 0.12 - 0.25 - 1.2 mm (pinhole)
  • Automation sample stage: 200x200mm, 300x300 mm XY sample stage, manual height (4mm) and tilt adjustment, XYZ sample stage, theta stage
  • Automatic goniometer: Automatically adjustable angle from 40° to 90° by step of 0.01°

Integrated Goniometer

  • Manual angle of incidence: 35° to 90° by 5° step
  • Sample holder: 150mm, 20mm manual z height adjustment
  • Autocollimation system for sample alignment in option
  • Dimension: width: 25cm; height: 35cm; depth: 21 cm

In situ configuration

  • Mechanical adaptation: CF35 or KF40 flanges
  • Easy swith between in-situ and ex-situ configurations
  • More information

Options

  • Accessories: temperature controlled cell, liquid cell, electrochemical cell, reflectometry module to measure reflectance at 0° incidence, and more
  • Spectroscopic reflectometer: 450-850nm, spot size 10µm
  • Vision: CCD camera
  • More information

Performance

  • Accuracy: Ψ= 45°±0.02° and Δ=0°±0.02° measured in straight-through air configuration 1.5 – 5 eV
  • Repeatability: NIST 1000Å SiO2/Si (190-2100 nm): d ± 0.1 % – n(632.8nm) ± 0.0001

Tags: ellip, ellipsometer, thin film

PT. HORIBA Indonesia

Ruko Jalur Sutera Jl. Jalur Sutera Blok 20 A No. 16-17 Tangerang, Banten 15144, Indonesia

Tel: +62 (21) 30448525
Fax: +62 (21) 30448521
Email: info-sci.id@horiba.com