Silicon
- J. Pisonero, L. Lobo, N. Bordel, A. Tempez, A. Bensaoula, N. Badi, A. Sanz-Medel, “Quantitative depth profile analysis of boron implanted silicon by pulsed radiofrequency- Glow Discharge-Time of Flight Mass Spectrometry”, Solar Energy Materials and Solar Cells, 94, 1352-1357 (2010). doi:10.1016/j.solmat.2010.04.002
Boron Oxynitride
- N. Badi, S. Vijayaraghavan, A. Bensaoula, A. Tempez, C. Tauziède, P. Chapon P2IMS depth profile analysis of high temperature boron oxynitride dielectric films Applied Surface Science, 2014, 292, pp 1-4. dx.doi.org/10.1016/j.apsusc.2013.09.056
